Substrate Stories

Refine by tag:
substrate
WpAddmarket
WpAddglass
substrate
WpAddmarket
WpAddglass

28 Stories

  • Enzymes and Substrates by DianaRose88
    DianaRose88
    • WpView
      Reads 75
    • WpPart
      Parts 1
    Description
  • APPLICATION RANGE OF SAPPHIRE CRYSTAL by cryscore
    cryscore
    • WpView
      Reads 2
    • WpPart
      Parts 1
    https://www.cryscore.com/application-range-of-sapphire-crystal.html Sapphire (a-Al2O3) is a multifunctional oxide crystal with excellent optical, physical, and chemical properties. In the field of optoelectronics, sapphire crystal is the preferred substrate material for manufacturing gallium nitride (GaN) light-emitting diode (LED); in the field of optical communication, sapphire crystal is not only used as a short wavelength active device, but also as a polarizer of passive devices; in the field of laser, sapphire is an excellent laser medium material (such as Ti: Al2O3, Cr: Al2O3); in the field of superconductivity, sapphire crystals can not only produce Y-series, La-series high-temperature superconducting films but also grow new practical MgB2 high-temperature superconducting films.
  • SAPPHIRE WAFER CLEANING EQUIPMENT by cryscore
    cryscore
    • WpView
      Reads 2
    • WpPart
      Parts 1
    https://www.cryscore.com/sapphire-wafer-cleaning-equipment.html Ultrasonic cleaning machine Ultrasonic cleaning machine is a kind of cleaning equipment widely used in the microelectronics industry. The principle of ultrasonic cleaning is that under the strong ultrasonic effect (the commonly used ultrasonic frequency is 20-40khz), the inside of the cleaning agent will produce sparse and dense parts, and the sparse part will produce nearly vacuum cavity. When the cavity disappears, strong local pressure will be generated nearby, it breaks the chemical bond in the molecule and desorbs the impurities on the surface of the sapphire wafer. When the ultrasonic frequency and the vibration frequency of the cavity resonate, the mechanical force reaches the maximum, and a large amount of heat energy accumulates in the bubble, which makes the temperature rise and promotes the occurrence of the chemical reaction. The improvement of ultrasonic power is helpful to promote the cleaning effect. Because the removal effect of the ultrasonic cleaning machine for small particles less than 1 μm is not ideal, the ultrasonic cleaning machine is mostly used to remove large contaminated particles attached to the surface of the sapphire wafer.
  • SAPPHIRE MATERIAL STATUS AND MARKET ANALYSIS by cryscore
    cryscore
    • WpView
      Reads 1
    • WpPart
      Parts 1
    https://www.cryscore.com/products/custom-sapphire-windows.html Sapphire is a single crystal of alumina(α-Al2O3), also known as corundum. Sapphire single crystal has a high melting point (2040 ℃), high hardness (Mohs hardness 9), stable chemical properties, good electrical insulation, especially excellent infrared transmittance. It can be used in near-infrared window, microwave tube dielectric material, ultrasonic transmission element, delay line, waveguide laser cavity and precision instrument bearing, balance blade, a semiconductor substrate, etc. Sapphire single crystal and its products play an important role in both military and civil use because they are widely used in the national defense industry, aerospace science and technology research and civil fields.
  • THE PROCESS OF POLISHING SAPPHIRE WAFER (PART 1) by cryscore
    cryscore
    • WpView
      Reads 3
    • WpPart
      Parts 1
    https://www.cryscore.com/the-process-of-polishing-sapphire-wafer-1.html The last process of the sapphire wafer is also the most important one, namely polished sapphire wafer. The quality of polishing process directly determines whether the product can be sent out and whether it meets the requirements of customers. The competition in this field is very fierce and also very strict. The following is to talk about the factors that determine the polishing yield. 1. Polishing fluid. Sapphire is a substance whose hardness is inferior to diamond in nature. Therefore, polishing sapphire wafer must first soften the sapphire to achieve the purpose of grinding. At present, alkaline polishing fluid is widely used in the industry to achieve better surface effect. The polishing fluid is very expensive, 30 or 40 yuan per kilogram, and one machine may consume about 100 kilograms a day, so its cost is the highest . How to better and more effectively use the polishing fluid is a major issue for us.
  • An enzyme love story  by seacatr
    seacatr
    • WpView
      Reads 57
    • WpPart
      Parts 4
    Their structured body built to fit mine walks by and I can't help but stare. It belongs to me. How does something so perfect exist? I think to myself, my dear substrate. Can me, a lonely enzyme, be their soulmate? the one it fits into? ------------------- A good read if you enjoy science humour! It may also help you learn a bit more about enzymes! I made it to help me with revision because i'm trash at school :/
  • THE MANUFACTURING PROCESS OF SAPPHIRE WAFER by cryscore
    cryscore
    • WpView
      Reads 3
    • WpPart
      Parts 1
    https://www.cryscore.com/products/sapphire-wafers-sapphire-substrates/ Sapphire wafer manufacturing process: 1. Orientation: Accurately locate the sapphire crystal rod position on the slicing machine, so as to facilitate precise slicing processing 2. Slicing: Cut the sapphire crystal rod into thin wafers 3. Grinding: Remove the chip cutting damage layer caused by slicing and improve the flatness of the wafer 4. Chamfering: Trim the wafer edge into a circular arc to improve the mechanical strength of the wafer edge to avoid the defects caused by stress concentration 5. Polishing: Improve the roughness of the wafer to reach the epitaxial wafer's precision 6. Cleaning: Remove the contaminants on the wafer surface (such as dust particles, metals, organic contaminants)